Ключевые слова: HTS, YBCO, substrate sapphire, magnetron sputtering, microstructure, fabrication
Lee S., MOLODYK A., Samoilenkov S., Blednov A., Markelov A., Petrykin V., Martynova I., Kalitka V., Makarevich A., Moyzykh M.
Ключевые слова: fabrication, coated conductors, buffer layers, texture, magnetron sputtering, X-ray diffraction
Ключевые слова: HTS, YBCO, films, substrate Hastelloy, IBAD process, texture, buffer layers, X-ray diffraction, magnetron sputtering, fabrication
Ключевые слова: HTS, Bi2223, doping effect, thin films, fabrication, magnetron sputtering, substrate single crystal, targets, composition, X-ray diffraction, microstructure, substitution
Ключевые слова: HTS, YBCO, coated conductors, fabrication, MOD process, buffer layers, magnetron sputtering, critical caracteristics, critical current, homogeneity, long conductors, commercialization, current leads, cables coaxial, cables three-phase, pinning centers artificial, angular dependence, plans, presentation
Ключевые слова: HTS, Bi2223, films, magnetron sputtering, heat treatment, microstructure
Ключевые слова: HTS, coated conductors, fabrication, buffer layers, magnetron sputtering, growth rate, thickness dependence
Ключевые слова: HTS, YBCO, coated conductors, critical caracteristics, critical current density, fabrication, cap layers, magnetron sputtering, surface, microstructure, roughness
Ключевые слова: HTS, coated conductors, buffer layers, fabrication, magnetron sputtering, substrate Hastelloy, texture
Ключевые слова: HTS, YBCO, coated conductors, buffer layers, roughness, microstructure, magnetron sputtering, IBAD process, substrate Hastelloy, fabrication
Ключевые слова: HTS, Bi2223, thin films, magnetron sputtering, annealing process, critical caracteristics, substrate SrTiO3, resistive transition, magnetic field dependence, Jc/B curves, upper critical fields, irreversibility fields, critical current, angular dependence, resistivity, MOCVD process, DI-Bi2223, experimental results
Ключевые слова: HTS, YBCO, coated conductors, buffer layers, high rate process, fabrication, magnetron sputtering, double-side structures, substrate Ni-W, texture, microstructure
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